Achieve high coverage in three-dimensional object film formation! Equipped with up to three sputter cathodes, it enables the layered deposition of metal films, oxide films, and more!
The "Sputtering Device for Three-Dimensional Objects" is equipped with our proprietary sputter cathode.
It features a 4-axis mechanism (elevation, revolution, rotation, tilt) on the work stage, achieving high coverage in the deposition of three-dimensional objects. It also includes a heating mechanism and bias power supply, enabling reverse sputtering, high-temperature sputtering, and film stress control.
It can accommodate up to three sputter cathodes, allowing for the layered deposition of metal films, oxide films, and more.
【Features】
- Equipped with our proprietary sputter cathode
- 4-axis mechanism on the work stage achieves high coverage in the deposition of three-dimensional objects
- Can accommodate up to three sputter cathodes for layered deposition of metal films, oxide films, etc.
- Custom orders can also be manufactured
- Sample processing is conducted using a demonstration machine
*For more details, please refer to the PDF document or feel free to contact us.